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Vertical III-V nanowire (NW) arrays are promising candidates for infrared (IR) photodetection applications. Generally, NWs with large diameters are required for efficient absorption in the IR range. However, increasing the NW diameter results in a loss of spectral selectivity and an enhancement in the photodetector dark current. Here, we propose a nanophotonic engineering approach to achieving spectrally-selective light absorption while minimizing the volume of the absorbing medium. Based on simulations performed using rigorous coupled-wave analysis (RCWA) techniques, we demonstrate dramatic tunability of the short-wavelength infrared (SWIR) light absorption properties of InAs NWs with base segments embedded in a reflective backside Au layer and with partial GaAs_0.1Sb_0.9shell segment coverage. Use of a backside reflector results in the generation of a delocalized evanescent field around the NW core segment that can be selectively captured by the partially encapsulating GaAs_0.1Sb_0.9shell layer. By adjusting the core and shell dimensions, unity absorption can be selectively achieved in the 2 to 3μm wavelength range. Due to the transparency of the GaAs_0.1Sb_0.9shell segments, wavelength-selective absorption occurs only along the InAs core segments where they are partially encapsulated. The design presented in this work paves the path toward spectrally-selective and polarization-dependent NW array-based photodetectors, in which carrier collection efficiencies can be enhanced by positioning active junctions at the predefined locations of the partial shell segments.

 

Self-assembly of vertically aligned III–V semiconductor nanowires (NWs) on two-dimensional (2D) van der Waals (vdW) nanomaterials allows for integration of novel mixed-dimensional nanosystems with unique properties for optoelectronic and nanoelectronic device applications. Here, selective-area vdW epitaxy (SA-vdWE) of InAs NWs on isolated 2D molybdenum disulfide (MoS 2 ) domains is reported for the first time. The MOCVD growth parameter space ( i.e. , V/III ratio, growth temperature, and total molar flow rates of metalorganic and hydride precursors) is explored to achieve pattern-free positioning of single NWs on isolated multi-layer MoS 2 micro-plates with one-to-one NW-to-MoS 2 domain placement. The introduction of a pre-growth poly- l -lysine surface treatment is highlighted as a necessary step for mitigation of InAs nucleation along the edges of triangular MoS 2 domains and for NW growth along the interior region of 2D micro-plates. Analysis of NW crystal structures formed under the optimal SA-vdWE condition revealed a disordered combination of wurtzite and zinc-blend phases. A transformation of the NW sidewall faceting structure is observed, resulting from simultaneous radial overgrowth during axial NW synthesis. A common lattice arrangement between axially-grown InAs NW core segments and MoS 2 domains is described as the epitaxial basis for vertical NW growth. A model is proposed for a common InAs/MoS 2 sub-lattice structure, consisting of three multiples of the cubic InAs unit cell along the [21̄1̄] direction, commensurately aligned with a 14-fold multiple of the Mo–Mo (or S–S) spacing along the [101̄0] direction of MoS 2 hexagonal lattice. The SA-vdWE growth mode described here enables controlled hybrid integration of mixed-dimensional III–V-on-2D heterostructures as novel nanosystems for applications in optoelectronics, nanoelectronics, and quantum enabling technologies.